academic article

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• Matrix-Isolation Study of the 193 nm Excimer-Laser Photochemistry of Hexafluorobenzene.  Laser Chem..  15:20-32. 1994
• 193nm Excimer-Laser Irradiation C6H6 and C6D6 at Cryogenic Temperatures.  J. Photochem. Photobiol. A: Chem..  74:99-108. 1993
• Matrix-Isolation Study ofthe 1:1 Molecular Complexes of Trimethylaluminum with the Group V and VI Bases.  J. Mol. Struct..  300:351-362. 1993
• 193nm Excimer-Laser Induced Photo oxidation or Propene in Argon Matrices.  J. Photochem. Photobiol. A: Chem..  59:19-28. 1991